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1. Identificação
Tipo de ReferênciaArtigo em Revista Científica (Journal Article)
Sitemtc-m16.sid.inpe.br
Código do Detentorisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Identificador6qtX3pFwXQZsFDuKxG/CADrv
Repositóriosid.inpe.br/marciana/2004/06.28.10.10
Última Atualização2013:05.14.17.30.34 (UTC) marciana
Repositório de Metadadossid.inpe.br/marciana/2004/06.28.10.10.24
Última Atualização dos Metadados2018:06.05.01.20.55 (UTC) administrator
Chave SecundáriaINPE-10767-PRE/6225
DOI10.1063/1.1431431
ISBN/ISSN0021-8979
ISSN0021-8979
Chave de CitaçãoFerreiraAbrLeiCorTra:2002:AnReSt
TítuloAnalysis of residual stress in diamond films by x-ray diffraction and micro-Raman spectroscopy
Ano2002
MêsFeb.
Data de Acesso18 maio 2024
Tipo SecundárioPRE PI
Número de Arquivos1
Tamanho607 KiB
2. Contextualização
Autor1 Ferreira, Neidenei Gomes
2 Abramof, Eduardo
3 Leite, Nelia Ferreira
4 Corat, Evaldo Jose
5 Trava-Airoldi, Vladimir Jesus
Grupo1 LAS-INPE-MCT-BR
2
3
4 LAS-INPE-MCT-BR
5 LAS-INPE-MCT-BR
Afiliação1 Instituto Nacional de Pesquisas Espaciais (INPE)
2 Instituto Nacional de Pesquisas Espaciais (INPE)
3 Instituto Nacional de Pesquisas Espaciais (INPE)
4 Instituto Nacional de Pesquisas Espaciais (INPE)
5 Instituto Nacional de Pesquisas Espaciais (INPE)
Endereço de e-Mail do Autor1 neidenei@las.inpe.br
2 eduardo.abramof@inpe.br
3 nelia.leite@inpe.br
4 corat@las.inpe.br
5 vladimir@las.inpe.br
RevistaJournal of Applied Physics
Volume91
Número4
Páginas2466
Histórico (UTC)2006-09-28 22:25:57 :: administrator -> sergio ::
2008-01-07 12:53:22 :: sergio -> administrator ::
2013-03-31 13:35:11 :: administrator -> marciana :: 2002
2013-05-14 17:30:35 :: marciana -> administrator :: 2002
2018-06-05 01:20:55 :: administrator -> marciana :: 2002
3. Conteúdo e estrutura
É a matriz ou uma cópia?é a matriz
Estágio do Conteúdoconcluido
Transferível1
Tipo do ConteúdoExternal Contribution
Tipo de Versãopublisher
Palavras-Chavechemical-vapor-deposition
thin-films
crystalline quality
intrinsic stress
cvd
strain
plasma
ResumoWe investigate the residual stress in diamond films grown on ~001! silicon substrates as a function of film thickness. The diamond films were deposited at 1070 K by the conventional hot filament technique using a gas mixture of methane ~1.0% vol! and hydrogen ~99.0% vol!. The film thickness, obtained from cross section scanning electron micrographs, varied from 3.0 to 42 mm as the growth time increased from 1 to 10 h. These images evidenced that the columnar growth is already established for films thicker than 10 mm. Top view micrographs revealed predominantly faceted pyramidal grains for the films at all growth stages. The grain size, obtained from these images, was found to vary linearly with film thickness. Using a high resolution x-ray diffractometer, the residual stress was determined by measuring, for each sample, the ~331! diamond Bragg diffraction peak for C values ranging from 260° to 160°, and applying the sin2 c method. For the micro-Raman spectroscopy, we used the summation method, which consists in recording and adding a large number of spectra in different places of a selected area of the sample. All Raman spectra were fitted with Lorentzian lines to separate the contribution of the pure diamond and the other nondiamond graphite! phases. This spectral analysis performed in each sample allowed the determination of the residual stress, from the diamond Raman peak shifts, and also the diamond purity, which increases from 70% to 90% as the thickness goes from 3 to 42 mm. The type and magnitude of the residual stress obtained from x-ray and micro-Raman measurements agreed well for films thicker than 10 mm. For films thinner than this value, an opposite behavior between both results was observed. We attributed this discrepancy to the domain size characteristic of each technique.
ÁreaFISMAT
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Conteúdo da Pasta agreementnão têm arquivos
4. Condições de acesso e uso
URL dos dadoshttp://urlib.net/ibi/6qtX3pFwXQZsFDuKxG/CADrv
URL dos dados zipadoshttp://urlib.net/zip/6qtX3pFwXQZsFDuKxG/CADrv
Idiomaen
Arquivo AlvoJApplPhys_91_2466.pdf
Grupo de Usuáriosadministrator
marciana
Grupo de Leitoresadministrator
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Visibilidadeshown
Detentor da CópiaSID/SCD
Política de Arquivamentoallowpublisher allowfinaldraft
Permissão de Atualizaçãonão transferida
5. Fontes relacionadas
Unidades Imediatamente Superiores8JMKD3MGPCW/3ESR3H2
URL (dados não confiáveis)http://dx.doi.org/10.1063/1.1431431
DivulgaçãoWEBSCI; PORTALCAPES; COMPENDEX.
Acervo Hospedeirosid.inpe.br/banon/2003/08.15.17.40
6. Notas
Campos Vaziosalternatejournal archivist callnumber copyright creatorhistory descriptionlevel e-mailaddress format isbn label lineage mark mirrorrepository nextedition notes orcid parameterlist parentrepositories previousedition previouslowerunit progress project readpermission resumeid rightsholder schedulinginformation secondarydate secondarymark session shorttitle sponsor subject tertiarymark tertiarytype typeofwork
7. Controle da descrição
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